A planar Al-Si Schottky barrier metal-oxide-semiconductor field effect transistor operated at cryogenic temperatures

Purches, W. E. and Rossi, A. and Zhao, R. and Kafanov, Sergey and Duty, T. L. and Dzurak, A. S. and Rogge, S. and Tettamanzi, G. C. (2015) A planar Al-Si Schottky barrier metal-oxide-semiconductor field effect transistor operated at cryogenic temperatures. Applied Physics Letters, 107 (6). ISSN 0003-6951

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Abstract

Schottky Barrier-MOSFET technology offers intriguing possibilities for cryogenic nano-scale devices, such as Si quantum devices and superconducting devices. We present experimental results on a device architecture where the gate electrode is self-aligned with the device channel and overlaps the source and drain electrodes. This facilitates a sub-5 nm gap between the source/drain and channel, and no spacers are required. At cryogenic temperatures, such devices function as p-MOS Tunnel FETs, as determined by the Schottky barrier at the Al-Si interface, and as a further advantage, fabrication processes are compatible with both CMOS and superconducting logic technology.

Item Type:
Journal Article
Journal or Publication Title:
Applied Physics Letters
Uncontrolled Keywords:
/dk/atira/pure/subjectarea/asjc/3100/3101
Subjects:
ID Code:
84912
Deposited By:
Deposited On:
27 Feb 2017 16:16
Refereed?:
Yes
Published?:
Published
Last Modified:
16 Nov 2020 07:18