Structural and functional analysis of nanopillar spin electronic devices fabricated by 3D focused ion beam lithography

Wu, M. C. and Aziz, A. and Witt, J. D. S. and Hickey, M. C. and Ali, M. and Marrows, C. H. and Hickey, B. J. and Blamire, M. G. (2008) Structural and functional analysis of nanopillar spin electronic devices fabricated by 3D focused ion beam lithography. Nanotechnology, 19 (48). ISSN 0957-4484

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Abstract

We discuss the fabrication of nanopillar spin electronic devices from metal multilayered heterostructures, utilizing a novel three-dimensional focused ion beam lithography process. Finite element simulation was performed to optimize the geometry of the nanopillar device and to demonstrate that current flow is perpendicular to the plane within the active region of the device. Clear zero-field current induced magnetization switching is observed in our nanopillar devices at room temperature.

Item Type:
Journal Article
Journal or Publication Title:
Nanotechnology
Uncontrolled Keywords:
/dk/atira/pure/subjectarea/asjc/2200/2208
Subjects:
ID Code:
63529
Deposited By:
Deposited On:
19 Apr 2013 10:23
Refereed?:
Yes
Published?:
Published
Last Modified:
13 May 2020 02:06