Structural and functional analysis of nanopillar spin electronic devices fabricated by 3D focused ion beam lithography

Wu, M. C. and Aziz, A. and Witt, J. D. S. and Hickey, M. C. and Ali, M. and Marrows, C. H. and Hickey, B. J. and Blamire, M. G. (2008) Structural and functional analysis of nanopillar spin electronic devices fabricated by 3D focused ion beam lithography. Nanotechnology, 19 (48). ISSN 0957-4484

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Official URL: https://doi.org/10.1088/0957-4484/19/48/485305

Abstract

We discuss the fabrication of nanopillar spin electronic devices from metal multilayered heterostructures, utilizing a novel three-dimensional focused ion beam lithography process. Finite element simulation was performed to optimize the geometry of the nanopillar device and to demonstrate that current flow is perpendicular to the plane within the active region of the device. Clear zero-field current induced magnetization switching is observed in our nanopillar devices at room temperature.

Item Type:

Journal Article

Journal or Publication Title:

Nanotechnology

Uncontrolled Keywords:

/dk/atira/pure/subjectarea/asjc/2200/2208

Subjects:

?? DOTSARRAYSBIOENGINEERINGMECHANICS OF MATERIALSMATERIALS SCIENCE(ALL)CHEMISTRY(ALL)MECHANICAL ENGINEERINGELECTRICAL AND ELECTRONIC ENGINEERING ??

Departments:

Faculty of Science and Technology > Physics

ID Code:

63529

Deposited By:

ep_importer_pure

Deposited On:

19 Apr 2013 10:23

Refereed?:

Yes

Published?:

Published

Last Modified:

15 Sep 2023 04:06

URI:

https://eprints.lancs.ac.uk/id/eprint/63529