Low temperature plasma-assisted chemical vapour deposition of amorphous carbon films for biomedical-polymeric substrates

McColl, I. R. and Grant, D. M. and Green, S. M. and Wood, J. V. and Parker, T. L. and Parker, K. and Goruppa, A. A. and Braithwaite, N. St J. (1994) Low temperature plasma-assisted chemical vapour deposition of amorphous carbon films for biomedical-polymeric substrates. Diamond and Related Materials, 3 (1-2). pp. 83-87. ISSN 0925-9635

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Abstract

Preliminary results have been obtained on the biocompatibility of amorphous carbon hydrogen (αC:H) coatings deposited on polystyrene. Deposition was carried out at low substrate temperatures using pulsed r.f. plasma-assisted chemical vapour deposition from a methane-hydrogen gas mixture. Cytotoxicity tests using a standard cell line indicate a high degree of biocompatibility. Specifically, αC:H is not toxic to cells, appears to increase cell attachment and affords normal cell growth rates. Wear and other tests have revealed no significant differences between these αC:H coatings and those deposited on a stainless steel at a higher substrate temperature, except for a more pronounced surface texture. However, position in the r.f. plasma was found to be critical for the deposition of good, adherent low temperature coatings.

Item Type:
Journal Article
Journal or Publication Title:
Diamond and Related Materials
Uncontrolled Keywords:
/dk/atira/pure/subjectarea/asjc/2200/2208
Subjects:
?? ELECTRONIC, OPTICAL AND MAGNETIC MATERIALSCHEMISTRY(ALL)MECHANICAL ENGINEERINGPHYSICS AND ASTRONOMY(ALL)MATERIALS CHEMISTRYELECTRICAL AND ELECTRONIC ENGINEERING ??
ID Code:
136834
Deposited By:
Deposited On:
23 Sep 2019 08:35
Refereed?:
Yes
Published?:
Published
Last Modified:
17 Sep 2023 02:40