Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method

Ftouni, Hossein and Blanc, Christophe and Sikora, A. and Richard, J. and Defoort, M. and Lulla, Kunal and Collin, Eddy and Bourgeois, Olivier (2012) Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method. Journal of Physics: Conference Series, 395. ISSN 1742-6588

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Abstract

The thermal properties of suspended thin films prepared by the micro-machining process have been measured using the 3ω dynamic method coupled to a Völklein geometry. A transducer (heater/thermometer) centered on the membrane is driven by an ac current causing periodic thermal oscillations. The measurement of the temperature oscillation on the membrane is made at the third harmonic using a Wheatstone bridge set up. Here by coupling the 3ω method to a Völklein geometry (suspended membrane) we obtained a highly sensitive technique to measure the thermal conductance with a resolution of (ΔK/K = 10−3) and a sensitivity of the order of nanoWatt/K, thanks to a very sensitive niobium nitride thermometry. This method is applied to measure the in-plane thermal conductivity of 100 nm silicon nitride membrane, in the temperature range of 10–275 K.

Item Type:
Journal Article
Journal or Publication Title:
Journal of Physics: Conference Series
Uncontrolled Keywords:
/dk/atira/pure/subjectarea/asjc/3100
Subjects:
ID Code:
87144
Deposited By:
Deposited On:
24 Jul 2017 12:48
Refereed?:
Yes
Published?:
Published
Last Modified:
01 Jan 2020 10:24