Single-electron tunneling through an individual arsenic dopant in silicon

Shorokhov, V. V. and Presnov, D. E. and Amitonov, S. V. and Pashkin, Yuri and Krupenin, V. A. (2017) Single-electron tunneling through an individual arsenic dopant in silicon. Nanoscale, 9 (2). pp. 613-620. ISSN 2040-3364

Full text not available from this repository.

Abstract

We report the single-electron tunneling behaviour of a silicon nanobridge where the effective island is a single As dopant atom. The device is a gated silicon nanobridge with a thickness and width of ∼20 nm, fabricated from a commercially available silicon-on-insulator wafer, which was first doped with As atoms and then patterned using a unique CMOS-compatible technique. Transport measurements reveal characteristic Coulomb diamonds whose size decreases with gate voltage. Such a dependence indicates that the island of the single-electron transistor created is an individual arsenic dopant atom embedded in the silicon lattice between the source and drain electrodes, and furthermore, can be explained by the increase of the localisation region of the electron wavefunction when the higher energy levels of the dopant As atom become occupied. The charge stability diagram of the device shows features which can be attributed to adjacent dopants, localised in the nanobridge, acting as charge traps. From the measured device transport, we have evaluated the tunnel barrier properties and obtained characteristic device capacitances. The fabrication, control and understanding of such “single-atom” devices marks a further step towards the implementation of single-atom electronics.

Item Type:
Journal Article
Journal or Publication Title:
Nanoscale
Uncontrolled Keywords:
/dk/atira/pure/subjectarea/asjc/2500
Subjects:
ID Code:
83644
Deposited By:
Deposited On:
03 Jan 2017 10:18
Refereed?:
Yes
Published?:
Published
Last Modified:
23 Sep 2020 03:15