Characteristics and durability of fluoropolymer thin films

Cheneler, David and Bowen, James and Evans, Stephen D. and Górzny, Marcin and Adams, Michael J. and Ward, Michael C. L. (2011) Characteristics and durability of fluoropolymer thin films. Polymer Degradation and Stability, 96 (4). pp. 561-565. ISSN 0141-3910

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Abstract

The use of plasma-polymerised fluoropolymer (CFxOy) thin films in the manufacture of microelectromechanical systems (MEMS) devices is well-established, being employed in the passivation step of the deep reactive ion etching (DRIE) process, for example. This paper presents an investigation of the effect of exposure to organic and aqueous liquid media on plasma-polymerised CFxOy thin films. Atomic force microscopy (AFM), scanning electron microscopy (SEM), ellipsometry, X-ray photoelectron spectroscopy (XPS) and dynamic wetting measurements were all employed as characterisation techniques. Highly basic aqueous solutions, including known silicon etchants, were found to cause delamination via degradation of the countersurface below the CFxOy thin film. Films were found to be stable in organic solvents, acidic aqueous solutions and slightly basic aqueous solutions.

Item Type: Journal Article
Journal or Publication Title: Polymer Degradation and Stability
Uncontrolled Keywords: /dk/atira/pure/subjectarea/asjc/3100/3104
Subjects:
Departments: Faculty of Science and Technology > Engineering
ID Code: 67483
Deposited By: ep_importer_pure
Deposited On: 08 Nov 2013 14:07
Refereed?: Yes
Published?: Published
Last Modified: 01 Jan 2020 08:42
URI: https://eprints.lancs.ac.uk/id/eprint/67483

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