Efficient fluorescence quenching near crystalline silicon from Langmuir-Blodgett dye films

Danos, Lefteris and Greef, Robert and Markvart, Tomas (2008) Efficient fluorescence quenching near crystalline silicon from Langmuir-Blodgett dye films. Thin Solid Films, 516 (20). pp. 7251-7255. ISSN 0040-6090

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Abstract

The distance dependence of the fluorescence efficiency from Langmuir Blodgett (LB) dye layers deposited on top of silicon substrates was studied for different silicon crystal orientations (<100 > and <111 >). The distance to the silicon surface was varied with stearic acid LB layers (SA). Spectroscopic Ellipsometry (SE) provided accurate measurements of the thickness of the separation steps and the refractive index of the dye layer. It was found that the fluorescence efficiency of the overlying LB dye layers was quenched significantly by the presence of the semiconductor at close distances to the surface. No significant difference in the fluorescence quenching for the LB dye between the two crystal orientations was observed. The results obtained are compared with previous work from fluorescence time and intensity measurements. The importance of interference effects is stressed at high semi conductor-dye distances but the fluorescence quenching observed at small distances is due to efficient energy transfer to the semiconductor. (c) 2007 Elsevier B.V. All rights reserved.

Item Type:
Journal Article
Journal or Publication Title:
Thin Solid Films
Uncontrolled Keywords:
/dk/atira/pure/subjectarea/asjc/2500/2506
Subjects:
ID Code:
62837
Deposited By:
Deposited On:
15 Mar 2013 16:34
Refereed?:
Yes
Published?:
Published
Last Modified:
03 Nov 2020 02:31