A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff

Rosamond, Mark C. and Gallant, Andrew J. and Petty, Michael C. and Kolosov, Oleg and Zeze, Dagou A. (2011) A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff. Advanced Materials, 23 (43). pp. 5039-5044. ISSN 0935-9648

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Abstract

A new low-cost top-down nanolithography technique based on controlled undercutting and liftoff is reported. The method is applicable to a wide selection of inorganic materials (those that can be patterned by dry etching or lift-off) and can create 100-nm sized structures over wafer-sized areas. The method requires only conventional microfabrication processes and is ideal for producing nanowires, rings, and dots. A proof-of-concept experiment is also described for the fabrication of gold-nanowire transparent conducting electrodes, which show excellent optoelectronic properties.

Item Type:
Journal Article
Journal or Publication Title:
Advanced Materials
Uncontrolled Keywords:
/dk/atira/pure/researchoutput/libraryofcongress/qc
Subjects:
ID Code:
57388
Deposited By:
Deposited On:
14 Aug 2012 15:20
Refereed?:
Yes
Published?:
Published
Last Modified:
07 Jan 2020 03:40