Techniques for Monitoring and Fault Diagnostics of Industrial Plasma Processes and Applications

Sethi, Shakti Prasad and Singh, Ajay Pal and Joshi, Mohit Kumar (2026) Techniques for Monitoring and Fault Diagnostics of Industrial Plasma Processes and Applications. IEEE Transactions on Plasma Science. pp. 1-14. ISSN 0093-3813

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Abstract

Plasma science and technology are considered an important source of applications for various industrial processes and scientific research. The scope of plasma sources is applied in various areas of science and engineering disciplines to leverage new applications with better efficiency and productivity. This article presents various techniques developed for monitoring plasma processes and discusses methods applied to diagnosing fault events during operation. It reviews the application of sensors, probes, and invasive as well as noninvasive diagnostic techniques for fault detection and mitigation of challenges in plasma systems. In this article, the role of signal and image processing techniques in fault event diagnosis is highlighted. The study also highlights the application of machine learning (ML) and optimization methods for fault classification and the optimization of plasma processes. Schematics of key experimental setups incorporating various sensing techniques are presented to facilitate better understanding, and the associated application-specific techniques are also explained. This article presents a comprehensive review of implemented techniques for identifying fault events in plasma processes, optimizing overall process efficiency, and enhancing system performance.