Mechanochemistry at silicon surfaces

Sweetman, Adam and Jarvis, Samuel Paul and Moriarty, Philip (2015) Mechanochemistry at silicon surfaces. In: Noncontact Atomic Force Microscopy. NanoScience and Technology . Springer Verlag, pp. 247-274. ISBN 9783319358765

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Abstract

Non-contact atomic force microscopy has driven the development of a variety of exciting chemomechanical protocols for manipulating metal, semiconductor, and insulating surfaces at the single chemical bond limit. In this chapter we discuss atomic manipulation on silicon surfaces via mechanical force alone (mechanochemistry), with a particular focus on a prototype of a mechanicallyactuated atomic switch: the flipping of bi-stable dimers on the Si(100)–c(4 × 2) surface. The importance of the mutual orientation of electronic orbitals in the dimer manipulation process is explored in the broader context of the mechanochemical modification of covalently bonded semiconductors. In addition, variations in surface reactivity play a key role in the ability to generate (and image) atomic-scale modifications and we discuss experimental and theoretical work on H:Si(100) as an exemplar of a passivated and chemically inert substrate, as compared to the relatively high reactivity of the unpassivated Si(100) surface.

Item Type:
Contribution in Book/Report/Proceedings
Uncontrolled Keywords:
/dk/atira/pure/subjectarea/asjc/2200/2208
Subjects:
ID Code:
158611
Deposited By:
Deposited On:
15 Nov 2021 14:48
Refereed?:
Yes
Published?:
Published
Last Modified:
19 Nov 2021 16:25