Satyanarayana, B.S. and Peng, X.L. and Adamopoulos, George and Robertson, J. and Milne, W.I. and Clyne, T.W. (2000) Very low field electron emission from hot filament CVD grown microcrystalline diamond. MRS Online Proceedings Library, 621. Q531-Q537. ISSN 0272-9172Full text not available from this repository.
Very low threshold field emission from undoped microcrystalline diamond films grown by the hot filament chemical vapour deposition process (HFCVD) is reported. The effect of crystal size, methane concentration and the temperature has been studied. The microcrystalline diamond films grown using 3% methane (CH4) / hydrogen (H2) gas mixture ratio under varying deposition temperatures exhibit very low emission threshold fields. The threshold fields varied from 0.4 V/μm to 1 V/μm for an emission current density of 1 μA/cm2. A correlation between the emission characteristics and the material properties is presented. These films exhibit an emission site density of ∼104-105/cm2 at an applied field of 3 V/μm.
|Journal or Publication Title:||MRS Online Proceedings Library|
|Uncontrolled Keywords:||Chemical vapor deposition ; Concentration (process) ; Current density ; Electron emission ; Film growth ; Polycrystalline materials ; Hot filaments ; Diamond films|
|Subjects:||T Technology > TA Engineering (General). Civil engineering (General)|
|Departments:||Faculty of Science and Technology > Engineering|
|Deposited On:||30 Oct 2012 14:36|
|Last Modified:||03 Nov 2015 16:33|
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