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Very low field electron emission from hot filament CVD grown microcrystalline diamond

Satyanarayana, B.S. and Peng, X.L. and Adamopoulos, George and Robertson, J. and Milne, W.I. and Clyne, T.W. (2000) Very low field electron emission from hot filament CVD grown microcrystalline diamond. MRS Online Proceedings Library, 621. Q531-Q537. ISSN 0272-9172

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Very low threshold field emission from undoped microcrystalline diamond films grown by the hot filament chemical vapour deposition process (HFCVD) is reported. The effect of crystal size, methane concentration and the temperature has been studied. The microcrystalline diamond films grown using 3% methane (CH4) / hydrogen (H2) gas mixture ratio under varying deposition temperatures exhibit very low emission threshold fields. The threshold fields varied from 0.4 V/μm to 1 V/μm for an emission current density of 1 μA/cm2. A correlation between the emission characteristics and the material properties is presented. These films exhibit an emission site density of ∼104-105/cm2 at an applied field of 3 V/μm.

Item Type: Journal Article
Journal or Publication Title: MRS Online Proceedings Library
Uncontrolled Keywords: Chemical vapor deposition ; Concentration (process) ; Current density ; Electron emission ; Film growth ; Polycrystalline materials ; Hot filaments ; Diamond films
Subjects: ?? ta ??
Departments: Faculty of Science and Technology > Engineering
ID Code: 58588
Deposited By: ep_importer_pure
Deposited On: 30 Oct 2012 14:36
Refereed?: Yes
Published?: Published
Last Modified: 19 Jun 2018 03:23
Identification Number:

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