Shekhawat, G. S. and Kolosov, Oleg and Briggs, G. Andrew D. and Shaffer, E. O. and Martin, S. J. and Geer, R. E. (2000) Nanoscale elastic imaging: a new metrology tool for low-k dielectric integration. In: Interconnect Technology Conference, 2000. Proceedings of the IEEE 2000 International. IEEE, New York, pp. 96-98. ISBN 0-7803-6327-2Full text not available from this repository.
A new characterization tool based on ultrasonic force microscopy (UFM) has been developed to image the nanoscale mechanical properties of metal/low-k polymer damascence test structures. Metal and polymer regions are differentiated on the basis of elastic modulus with a spatial resolution less than or equal to 10 nm. This technique reveals a RIE-induced hardening of the low-k polymer at the metal/polymer interface and offers new opportunities for metrological reliability evaluation of low-k integration processes.
|Item Type:||Contribution in Book/Report/Proceedings|
|Subjects:||Q Science > QC Physics|
|Departments:||Faculty of Science and Technology > Physics|
|Deposited On:||09 Oct 2012 14:25|
|Last Modified:||03 Nov 2015 20:44|
Actions (login required)