Shekhawat, G. S. and Kolosov, Oleg and Briggs, G. Andrew D. and Shaffer, E. O. and Martin, S. J. and Geer, R. E. (2000) Nanoscale elastic imaging: a new metrology tool for low-k dielectric integration. In: Interconnect Technology Conference, 2000. Proceedings of the IEEE 2000 International. IEEE, New York, pp. 96-98. ISBN 0-7803-6327-2
Full text not available from this repository.Abstract
A new characterization tool based on ultrasonic force microscopy (UFM) has been developed to image the nanoscale mechanical properties of metal/low-k polymer damascence test structures. Metal and polymer regions are differentiated on the basis of elastic modulus with a spatial resolution less than or equal to 10 nm. This technique reveals a RIE-induced hardening of the low-k polymer at the metal/polymer interface and offers new opportunities for metrological reliability evaluation of low-k integration processes.
| Item Type: | Contribution in Book/Report/Proceedings |
|---|---|
| Subjects: | Q Science > QC Physics |
| Departments: | Faculty of Science and Technology > Physics |
| ID Code: | 57448 |
| Deposited By: | ep_importer_pure |
| Deposited On: | 09 Oct 2012 14:25 |
| Refereed?: | No |
| Published?: | Published |
| Last Modified: | 09 Oct 2012 14:25 |
| Identification Number: | |
| URI: | http://eprints.lancs.ac.uk/id/eprint/57448 |
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