Tzalenchuk, Alexander and Lara-Avila, Samuel and Cedergren, Karin and Syvajarvi, Mikael and Yakimova, Rositza and Kazakova, Olga and Janssen, T. J. B. M. and Moth-Poulsen, Kasper and Bjornholm, Thomas and Kopylov, Sergey and Falko, Vladimir and Kubatkin, Sergey (2011) Engineering and metrology of epitaxial graphene. Solid State Communications, 151 (16). pp. 1094-1099. ISSN 0038-1098
Full text not available from this repository.
Official URL: https://doi.org/10.1016/j.ssc.2011.05.020
Abstract
Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.
Item Type:
Journal Article
Journal or Publication Title:
Solid State Communications
Uncontrolled Keywords:
/dk/atira/pure/researchoutput/libraryofcongress/qc
Subjects:
?? A. GRAPHENED. QUANTUM HALL EFFECT D. PHOTOCHEMICAL GATE E. METROLOGYPHYSICSMATERIALS CHEMISTRYCHEMISTRY(ALL)CONDENSED MATTER PHYSICSQC PHYSICS ??
Departments:
ID Code:
57056
Deposited By:
Deposited On:
15 Aug 2012 11:46
Refereed?:
Yes
Published?:
Published
Last Modified:
18 Sep 2023 00:34