Arivuoli, D. and Lawson, N. S. and Krier, A. and Attolini, G. and Pelosi, C. (2000) Nanoindentation studies of MOVPE grown GaAs/InP heterostructures. . MATERIALS CHEMISTRY AND PHYSICS, 66 (2 - 3). pp. 207-212. ISSN 0254-0584Full text not available from this repository.
Mismatched semiconductor III-V heterostructures are interesting for advanced integrated device fabrication. The surface properties studied by the nanoindentation technique can reveal information about the elastic recovery, relative hardness and in particular surface flow properties. In this work nanoindentation studies have been carried out on GaAs/InP heterostructures grown by metal organic vapour phase epitaxy. The depth of penetration is continuously monitored during loading and unloading. The contour map determined by profilometry and surface analysis by AFM indicates that the material piles up after a particular load. The results of the present investigation along with growth conditions and the effect of lattice mismatch are discussed. (C) 2000 published by Elsevier Science S.A.
|Journal or Publication Title:||MATERIALS CHEMISTRY AND PHYSICS|
|Uncontrolled Keywords:||Heterostructures ; Nanoindentation ; Mechanical properties|
|Subjects:||Q Science > QC Physics|
|Departments:||Faculty of Science and Technology > Physics|
|Deposited By:||Dr Susan E. Krier|
|Deposited On:||18 Mar 2008 10:04|
|Last Modified:||26 Jul 2012 18:11|
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