Shekhawat, G. S. and Kolosov, O. V. and Briggs, G. A.D. and Shaffer, E. O. and Martin, S. and Geer, R. E. (2000) Nanoscale elastic imaging of aluminum/low-k dielectric interconnect structures. Materials Research Society Symposium-Proceedings, 612. D171-D177. ISSN 0272-9172
Full text not available from this repository.Abstract
A new characterization tool based on ultrasonic force microscopy (UFM) has been developed to image the nanometer scale mechanical properties of aluminum/low-k polymer damascene integrated circuit (IC) test structures. Aluminum and polymer regions are differentiated on the basis of elastic modulus with a spatial resolution ≤10 nm. This technique reveals a reactive-ion etch (RIE)-induced hardening of the low-k polymer that is manifested in the final IC test structure by a region of increased hardness at the aluminum/polymer interface. The ability to characterize nanometer scale mechanical properties of materials used for IC back-end-of-line (BEOL) manufacture offers new opportunities for metrological reliability evaluation of low-k integration processes.