Davidson, K. and El-Attawy, S. and El-Gamal, M. and Khattab, M. A. and El-Demerdach, A. M. (2002) Synthesis of new polymers for photoresist and lithographic printing applications. High Performance Polymers, 14 (1). pp. 3-15. ISSN 0954-0083Full text not available from this repository.
Lithographic resist materials based on copolymers and/or terpolymers have been synthesised. These materials are comprised of one component to induce water solubility, such as Nvinyl pyrrolidinone (NVP) or N, Ndimethyl acrylamide (DMAC); and another material to give the photoactive response, in this case allyl glycidyl ether (AGE) or glycidyl methacrylate (GMA). Copolymers and terpolymers of various compositions have been prepared by free radical copolymerization. Cationically initiated photocrosslinking was induced using mixed arylsulphonium hexaflouroantimonate (MAS+-SbF6) as a photoacid generating (PAG) species.
|Journal or Publication Title:||High Performance Polymers|
|Subjects:||Q Science > QH Natural history > QH301 Biology|
|Deposited By:||Mr Richard Ingham|
|Deposited On:||23 Jul 2008 13:24|
|Last Modified:||03 Nov 2015 13:44|
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