Synthesis of new polymers for photoresist and lithographic printing applications.

Davidson, K. and El-Attawy, S. and El-Gamal, M. and Khattab, M. A. and El-Demerdach, A. M. (2002) Synthesis of new polymers for photoresist and lithographic printing applications. High Performance Polymers, 14 (1). pp. 3-15. ISSN 0954-0083

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Abstract

Lithographic resist materials based on copolymers and/or terpolymers have been synthesised. These materials are comprised of one component to induce water solubility, such as Nvinyl pyrrolidinone (NVP) or N, Ndimethyl acrylamide (DMAC); and another material to give the photoactive response, in this case allyl glycidyl ether (AGE) or glycidyl methacrylate (GMA). Copolymers and terpolymers of various compositions have been prepared by free radical copolymerization. Cationically initiated photocrosslinking was induced using mixed arylsulphonium hexaflouroantimonate (MAS+-SbF6) as a photoacid generating (PAG) species.

Item Type:
Journal Article
Journal or Publication Title:
High Performance Polymers
Uncontrolled Keywords:
/dk/atira/pure/subjectarea/asjc/2500/2505
Subjects:
?? materials chemistryorganic chemistrypolymers and plasticsqh301 biology ??
ID Code:
10726
Deposited By:
Deposited On:
23 Jul 2008 12:24
Refereed?:
Yes
Published?:
Published
Last Modified:
15 Jul 2024 09:17