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Synthesis of new polymers for photoresist and lithographic printing applications.

Davidson, K. and El-Attawy, S. and El-Gamal, M. and Khattab, M. A. and El-Demerdach, A. M. (2002) Synthesis of new polymers for photoresist and lithographic printing applications. High Performance Polymers, 14 (1). pp. 3-15. ISSN 0954-0083

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Abstract

Lithographic resist materials based on copolymers and/or terpolymers have been synthesised. These materials are comprised of one component to induce water solubility, such as Nvinyl pyrrolidinone (NVP) or N, Ndimethyl acrylamide (DMAC); and another material to give the photoactive response, in this case allyl glycidyl ether (AGE) or glycidyl methacrylate (GMA). Copolymers and terpolymers of various compositions have been prepared by free radical copolymerization. Cationically initiated photocrosslinking was induced using mixed arylsulphonium hexaflouroantimonate (MAS+-SbF6) as a photoacid generating (PAG) species.

Item Type: Article
Journal or Publication Title: High Performance Polymers
Subjects: Q Science > QH Natural history > QH301 Biology
Departments: UNSPECIFIED
ID Code: 10726
Deposited By: Mr Richard Ingham
Deposited On: 23 Jul 2008 13:24
Refereed?: Yes
Published?: Published
Last Modified: 09 Apr 2014 20:18
Identification Number:
URI: http://eprints.lancs.ac.uk/id/eprint/10726

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